Urnik
pospeševalnika

DatumUporabnikŽarekEnergijaŽarkovna linijaIzvorVeč
23.10.202035Cl1+/-10° MicrobeamSputter ion source
22.10.2020Matej Lipoglavšek14N2+3,875 MeV+10° PIXE/RBSSputter ion source
21.10.2020Matej Lipoglavšek14N2+3,875 MeV+10° PIXE/RBSSputter ion source
20.10.2020Matej Lipoglavšek14N2+3,875 MeV+10° PIXE/RBSSputter ion source
19.10.2020Matej Lipoglavšek14N2+3,875 MeV+10° PIXE/RBSSputter ion source
18.10.2020Matej Lipoglavšek14N2+3,875 MeV+10° PIXE/RBSSputter ion source
17.10.2020Matej Lipoglavšek14N2+3,875 MeV+10° PIXE/RBSSputter ion source
16.10.202014N1+//Sputter ion source

Pripravljanje dušikovega žarka

15.10.202014N1+//Sputter ion source

Pripravljanje dušikovega žarka

14.10.2020Matej Lipoglavšek3He2+4,2 MeV, 3,3 MeV+10° ERDA/RBS/NRADuoplasmatron ion source

Globinsko profiliranje devterija.

Deuterium depth profiling.

14.10.2020Matej Lipoglavšek3He1+2,5 MeV, 1,5 MeV, 1 MeV, 0,7 MeV, 0,6 MeV+10° ERDA/RBS/NRADuoplasmatron ion source

Globinsko profiliranje devterija.

 

13.10.2020Matej Lipoglavšek19F5+9 MeV; 7,5 MeV; 6 MeV; 3 MeV; 2,4 MeV; 2 MeV+10° PIXE/RBSSputter ion source
12.10.2020Matej Lipoglavšek19F5+9 MeV; 7,5 MeV; 6 MeV; 3 MeV; 2,4 MeV; 2 MeV+10° PIXE/RBSSputter ion source
09.10.2020Matej Lipoglavšek19F5+9 MeV; 7,5 MeV; 6 MeV; 3 MeV; 2,4 MeV; 2 MeV+10° PIXE/RBSSputter ion source
08.10.2020Matej Lipoglavšek19F4+9 MeV; 7,5 MeV; 6 MeV; 3 MeV; 2,4 MeV; 2 MeV+10° PIXE/RBSSputter ion source
07.10.2020Matej Lipoglavšek19F4+9 MeV; 7,5 MeV; 6 MeV; 3 MeV; 2,4 MeV; 2 MeV+10° PIXE/RBSSputter ion source
06.10.2020/14N2+//Sputter ion source

Pripravljanje dušikovega ionskega žarka.

05.10.2020/14N2+//Sputter ion source

Pripravljanje dušikovega ionskega žarka.

02.10.2020Servis19F1+//Sputter ion source
01.10.2020Servis19F1+//Sputter ion source
30.09.2020Servis19F1+//Sputter ion source
29.09.2020PNDetector1H1+3 MeV-10° MicrobeamMulticusp ion source

Testiranje novega detektorja.

28.09.2020Ni meritev.////
24.09.20201H1+3 MeV/Multicusp ion source
23.09.2020Kristina Isaković1H1+3 MeV-30° External beamMulticusp ion source
22.09.2020/19F1+30,5 keV/Sputter ion source

Nastavljanje florovega žarka.

21.09.2020/19F1+30,5 keV/Sputter ion source

Nastavljanje florovega žarka.

18.09.2020Servis1H1+//Sputter ion source
17.09.2020Servis1H1+//Sputter ion source
16.09.2020Matej Lipoglavšek19F5+9 Mev - 3 MeV+10° PIXE/RBSSputter ion source
15.09.2020Matej Lipoglavšek14N3+3,626 MeV+10° PIXE/RBSSputter ion source