Urnik
pospeševalnika

DatumUporabnikŽarekEnergijaŽarkovna linijaIzvorVeč
04.12.2020Primož Pelicon35Cl5+5 MeV-10° MicrobeamSputter ion source

MeV SIMS

03.12.2020Primož Pelicon35Cl7+9,9 MeV-10° MicrobeamSputter ion source

MeV SIMS

02.12.2020Primož Pelicon35Cl6+7,3 MeV-10° MicrobeamSputter ion source

MeV SIMS

01.12.2020Primož Pelicon35Cl5+5 MeV-10° MicrobeamSputter ion source

MeV SIMS

30.11.2020Primož Pelicon35Cl4+3,2 MeV-10° MicrobeamSputter ion source

MeV SIMS

27.11.2020Sabina Markelj3He1+4,2 MeV, 3,3 MeV, 2,5 MeV; 1,5 MeV; 1,0 MeV; 0,7 MeV+10° ERDA/RBS/NRADuoplasmatron ion source

Deuterium depth profiling

26.11.2020Sabina Markelj3He1+4,2 MeV, 3,3 MeV, 2,5 MeV, 1,5 MeV, 1 MeV, 0,7 MeV, 0,6 MeV+10° PIXE/RBSDuoplasmatron ion source

Globinsko profiliranje devterija

25.11.2020Sabina Markelj3He1+4,2 MeV, 3,3 MeV, 2,5 MeV, 1,5 MeV, 1 MeV, 0,7 MeV, 0,6 MeV+10° ERDA/RBS/NRADuoplasmatron ion source

Globinsko profiliranje devterija

24.11.2020Sabina Markelj3He1+4,2 MeV, 3,3 MeV, 2,5 MeV, 1,5 MeV, 1 MeV, 0,7 MeV, 0,6 MeV+10° ERDA/RBS/NRADuoplasmatron ion source

Globinsko profiliranje devterija

23.11.2020Sabina Markelj3He1+4,2 MeV, 3,3 MeV, 2,5 MeV, 1,5 MeV, 1 MeV, 0,7 MeV, 0,6 MeV+10° ERDA/RBS/NRADuoplasmatron ion source

Globinsko profiliranje devterija

20.11.2020Sabina Markelj4He1+0,7 MeV+10° ERDA/RBS/NRADuoplasmatron ion source
19.11.2020Sabina Markelj4He1+0,7 MeV+10° ERDA/RBS/NRADuoplasmatron ion source
18.11.2020Primož Pelicon35Cl5+5 MeV-10° MicrobeamSputter ion source

MeV SIMS

17.11.2020Primož Pelicon35Cl5+5 MeV-10° MicrobeamSputter ion source

MeV SIMS

16.11.2020Primož Pelicon35Cl5+5 MeV-10° MicrobeamSputter ion source

MeV SIMS

13.11.2020Ni meritev.////
12.11.2020Ni meritev.////
11.11.2020Ni meritev.////
10.11.2020Ni meritev.////
09.11.2020Ni meritev.////
06.11.2020Ni meritev.////
05.11.2020Ni meritev.////
04.11.2020Ni meritev.////
03.11.2020Ni meritev.////
02.11.2020Ni meritev.////
30.10.2020Ni meritev.////
29.10.2020Ni meritev.////
28.10.2020Ni meritev.////
27.10.2020Ni meritev.////
26.10.2020Ni meritev.////


 

23.10.202035Cl1+/-10° MicrobeamSputter ion source